Development Of Interference Lithography Capability Using A Helium Cadmium Ultraviolet Multimode Laser For The Fabrication Of Sub-Micron-Structured Optical Materials
Development Of Interference Lithography Capability Using A Helium Cadmium Ultraviolet Multimode Laser For The Fabrication Of Sub-Micron-Structured Optical Materials
The Tocqueville Review / La Revue Tocqueville Vol. Ii N° 1 (Winter 1980) : Raymond Boudon / François Bourricaud / Michel Crozier / Richard Sennett / Stanley Hoffmann / Martin A. Schain / J.-D. Reynaud
