Low Pressure Plasmas and Microstructuring Technology - Franz, Gerhard
- Format: Broché Voir le descriptif
248,23 €
Produit Neuf
Ou 62,06 € /mois
- Livraison : 3,99 €
- Livré entre le 21 et le 28 septembre
- Payez directement sur Rakuten (CB, PayPal, 4xCB...)
- Récupérez le produit directement chez le vendeur
- Rakuten vous rembourse en cas de problème
Gratuit et sans engagement
Félicitations !
Nous sommes heureux de vous compter parmi nos membres du Club Rakuten !
TROUVER UN MAGASIN
Retour
Avis sur Low Pressure Plasmas And Microstructuring Technology Format Broché - Livre Encyclopédies, Dictionnaires
0 avis sur Low Pressure Plasmas And Microstructuring Technology Format Broché - Livre Encyclopédies, Dictionnaires
Les avis publiés font l'objet d'un contrôle automatisé de Rakuten.
-
Collection Entremets & Petits Gâteaux
1 avis
Occasion dès 129,00 €
-
Pierre Bayle
Neuf dès 222,62 €
-
The Fourth World Omnibus Vol. 2
Neuf dès 134,88 €
-
Quantum Electrodynamics Of Strong Fields
Neuf dès 211,28 €
-
Advanced Quantum Mechanics
Neuf dès 145,54 €
-
Custom Lettering Of The '60s & '70s
Occasion dès 162,00 €
-
Diego Rivera. The Complete Murals
Neuf dès 212,44 €
-
Flashpoint: The 10th Anniversary Omnibus
Neuf dès 158,08 €
-
A Court Of Thorns And Roses Paperback Box Set
Occasion dès 171,95 €
-
Bay Area Graffiti 80-90
1 avis
Occasion dès 325,99 €
-
Monster Hunter: World - Official Complete Works
1 avis
Neuf dès 215,99 €
-
Art Of Sea Of Thieves
1 avis
Neuf dès 127,99 €
-
Elementary Fluid Mechanics
Neuf dès 354,14 €
-
Car Racing 1971
Neuf dès 129,00 €
-
Lawrence Weiner: Displacement
Occasion dès 207,99 €
-
Soviet Military Deception In The Second World War
Neuf dès 195,80 €
-
Norstedts Stora Svensk-Engelska Ordbok : Norstedts Comprehensive Swedish-English Dictionary
Occasion dès 205,00 €
-
Art+Com
Occasion dès 155,99 €
-
The Lord Of The Rings
Neuf dès 190,88 €
-
Nuancier Dcs Cmyk Pro
Occasion dès 230,00 €
Produits similaires
Présentation Low Pressure Plasmas And Microstructuring Technology Format Broché
- Livre Encyclopédies, Dictionnaires
Résumé :
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore?slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]?no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Détails de conformité du produit
Personne responsable dans l'UE